The process flow is based on conventional 6025 photomask blanks. Goal of this work was to develop a template process scheme which enables the generation of high resolution pillars on top of corresponding lines for direct printing of later vias and metal lines. Combined with a UV printable low-k material the NIL lithography can dramatically simplify the dual damascene process. NIL technique enables an easy replication of three dimensional patterns. 3D template fabrication process for the dual damascene NIL approach 3D template fabrication process for the dual damascene NIL approachīutschke, Joerg Resnick, Douglas Sailer, Holger Thompson, Ecron
0 Comments
Leave a Reply. |
AuthorWrite something about yourself. No need to be fancy, just an overview. Archives
June 2023
Categories |